Deposition Systems

Ion Sources

Crystal Monitors

Feedthroughs

Sunnet Systems Inc. 

Corporate Offices

2100 Walsh Ave, Suite B1, 

Santa Clara, CA 95050

Tel:        408-845-0080

Fax:       408-845-0056 

mailto:sales@sunnetsystems.com

Veeco's DC ion sources combine purpose built fully integrated ion source power supplies with the industry's broadest range of ion source and grid set options.  The use of biased grid technology provides these ion sources with substantially higher energy ions resulting in higher sputtered deposition and etch rates than gridless ion sources.  With more than 300 gridset designs available, Veeco has the right solution for your application. 

The 3cm DC ion beam source is designed to be compact, economical, easy to install and capable of substantial beam current and energy operations.  Available in both filament and hollow cathode versions, the 3cm DC ion source can meet the needs of batch and load-lock processes.  This source is widely used in R&D and small production systems for both ion beam deposition and ion beam etch.

The 5cm DC ion beam source is designed to be compact, economical, easy to install and capable of substantially higher beam current and energy operations than it's 3cm sibling.  Available in filament, plasma bridge neutralizer and hollow cathode versions, the 5cm DC ion source can meet the needs of batch and load-lock processes.  This source is widely used in R&D and production systems for both ion beam deposition and ion beam etch.

The 11cm DC ion beam source is the ideal size for most applications with substrate up to 5-6 inches in diameter.  The 11cm DC is designed easy maintainability and is capable of substantially higher beam current and energy operations than it's 5cm sibling.  Available in filament, plasma bridge neutralizer and hollow cathode versions, the 11cm DC ion source can meet the needs of batch and load-lock processes.  This source is widely used in Large  R&D and production systems for ion beam deposition, DLC and ion beam etch.

The 15cm DC ion beam source is the ideal size for most applications with substrate up to ~8 inches in diameter.  The 15cm DC is designed easy maintainability and is capable of substantially higher beam current than it's 11cm sibling.  Available in filament, plasma bridge neutralizer and hollow cathode versions, the 15cm DC ion source can meet the needs of batch and load-lock processes.  This source is widely used in Large  R&D and production systems for ion beam deposition, DLC and ion beam etch.

The 21cm DC ion beam source is the ideal size for most applications with substrate up to 12 inches in diameter.  The 21cm DC is designed easy maintainability and is capable of substantially higher beam current than it's 15cm sibling.  Available in filament, plasma bridge neutralizer and hollow cathode versions, the 21cm DC ion source can meet the needs of batch and load-lock processes.  This source is widely used in Large  R&D and production systems for ion beam deposition, DLC and ion beam etch.

Veeco's linear DC ion sources feature the same innovative design, quality and reliability as our round DC sources but are designed for processes that incorporate large/wide individual substrates or large substrate batches loaded on linear or cylindrical fixturing.

Veeco's linear DC ion sources feature the same innovative design, quality and reliability as our round DC sources but are designed for processes that incorporate large/wide individual substrates or large substrate batches loaded on linear or cylindrical fixturing.