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Deposition Systems

    SPECTOR
    HDG
    Spare Parts

 

Ion Sources

    End-Hall
    DC Gridded
    RF Gridded
    Anode Layer
    Magnetron

 

Crystal Monitors

    Controllers
    Monitors
    Sensor Heads
    Sensor Chips

 

Feedthroughs

    Smart Seals
    Rotary 
    Drivethrus

 

Sunnet Systems Inc. 

Corporate Offices

2100 Walsh Ave, Suite B1, 

Santa Clara, CA 95050

Tel:        408-845-0080

Fax:       408-845-0056 

mailto:sales@sunnetsystems.com

Horizontal Dual Gun (HDG)

The HDG system is the leader in adaptability and flexibility.  The HDG can be configured as:
  • Dual Ion Beam Deposition
  • Ion Beam Deposition + Ion Beam Etch
  • Ion Beam Deposition
  • Ion Beam Etch
  • Manual Operation or Fully Automated

The HDG system is a popular research and development system with universities and companies requiring small volume production with maximum material flexibility.  

The HDG system can be combined with many of Veeco's small-medium sized DC and RF ion sources, supporting:

  • A wide range of substrate sizes
  • Metal and dielectric material compatibility

With the HDG's wide range of configuration options, we have the solution for your application.

Options and Accessories
wpe4.jpg (9945 bytes) Substrate Fixtures

The HDG can be supplies with single rotation water cooled fixtures with automated or manual tip-tilt capabilities.  Solutions are available for substrates up to 6-inches (150mm) in diameter.  For smaller substrates, the HDG can also be supplied with a planetary fixture. 

wpe6.jpg (9321 bytes) Ion Source and Neutralizers

Both RF and DC ion source and their corresponding neutralizers can be integrated into the system.  The HDG system supports deposition sources of 3cm - 6cm in diameter and Etch or assist sources from 3cm - 12cm in diameter.  Please refer to Veeco's Ion Source Products for specific information on the ion sources options available.

wpe8.jpg (10687 bytes) Gas Flow Control

A GFC-1000U Gas Flow Controller will be provided for the ion beam source(s) for automatic control of process gases.  The GFC-1000U can be configured for two or three channels of operation with independent or ratio control. 

High Vacuum Pump

The HDG can be configured with either a CTI-10 cryo pump with ON BOARD® control or a Leybold turbo pump.

Sourcerer Ion Beam System Manager

Automated HDG systems are supplied with the Sourcerer Ion Beam System Manager running on a dedicated control platform in a remote computer rack.  Sourcerer is the premier deposition system controller available today.  Providing an intuitive touch-screen user interface, system control is literally at your finger tips.   

Target Fixture

When configured for deposition functionality, the HDG is fitted with a water cooled 4-target assembly.  The assembly supports use of un to four different target materials in a single process run.  The target fixture supports four 5-inch (125mm) targets.

 

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