Angstrom Product Advantage
Magnetron sputtering technology has been utilized in production applications for several decades. The basic technology used to control process plasma within the deposition process is well established within the field; however the capabilities available to optimize process efficiencies, such as thin film uniformity, target utilization, and deposition rate, are continuously evolving.
Angstrom Sciences is focused upon the development of magnetron sputtering cathodes that optimize sputter process performance. The Angstrom Advantage™ is the collective set of technical and structural advancements Angstrom Sciences has designed into its magnetrons in order to provide its clients with the most control over their thin film deposition process.
Angstrom Magnetron Product
Angstrom Sciences’ magnetrons are engineered to meet stringent thin film uniformity, target utilization, and sputter rate specifications. In addition to the advanced performance results provided by the profiled magnets and turbulent water flow of the Angstrom Advantage™, Angstrom Sciences’ magnetron sputtering cathodes offer a host of other efficiencies.